Cheol Kim, Kirak Son, Gahui Kim, Sungtae Kim, Sol-Kyu Lee, So-Yeon Lee, Young-Bae Park* and Young-Chang Joo*, “A study on the interfacial adhesion energy between capping layer and dielectric for Cu interconnects”, Microelectronics Reliability, 2021, 116, 114020, DOI: 10.1016/j.microrel.2020.114020
