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A study on the interfacial adhesion energy between capping layer and dielectric for Cu interconnects

A study on the interfacial adhesion energy between capping layer and dielectric for Cu interconnects

저자

Cheol Kim, Kirak Son, Gahui Kim, Sungtae Kim, Sol-Kyu Lee, So-Yeon Lee, Young-Bae Park* and Young-Chang Joo*

저널 정보

Microelectronics Reliability, 2021, 116, 114020

출간연도

2021

Cheol Kim, Kirak Son, Gahui Kim, Sungtae Kim, Sol-Kyu Lee, So-Yeon Lee, Young-Bae Park* and Young-Chang Joo*, “A study on the interfacial adhesion energy between capping layer and dielectric for Cu interconnects”, Microelectronics Reliability, 2021, 116, 114020, DOI: 10.1016/j.microrel.2020.114020