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Bonding structure and etching characteristics of amorphous carbon for a hardmask deposited by DC sputtering

Bonding structure and etching characteristics of amorphous carbon for a hardmask deposited by DC sputtering

저자

So-Yeon Lee¹, Kyung-Tae Jang¹, Min-Woo Jeong, Sungtae Kim, Hwanyeol Park, Kuntae Kim, Gun-Do Lee, Miyoung Kim, and Young-Chang Joo*

저널 정보

Carbon, 2019, 154, 277-284

출간연도

2019

So-Yeon Lee¹, Kyung-Tae Jang¹, Min-Woo Jeong, Sungtae Kim, Hwanyeol Park, Kuntae Kim, Gun-Do Lee, Miyoung Kim, and Young-Chang Joo*, “Bonding structure and etching characteristics of amorphous carbon for a hardmask deposited by DC sputtering”, Carbon, 2019, 154, 277-284, https://doi.org/10.1016/j.carbon.2019.08.013