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Boron-doped amorphous carbon deposited by DC sputtering for a hardmask: Microstructure and dry etching properties

Boron-doped amorphous carbon deposited by DC sputtering for a hardmask: Microstructure and dry etching properties

저자

Sungtae Kim, Ung-gi Kim, Jinseok Ryu, Dokyun Kim, Miyoung Kim, Young-Chang Joo* and So-Yeon Lee*

저널 정보

Applied Surface Science, 2023, 637, 157895

출간연도

2023

Sungtae Kim, Ung-gi Kim, Jinseok Ryu, Dokyun Kim, Miyoung Kim, Young-Chang Joo* and So-Yeon Lee*. “Boron-doped amorphous carbon deposited by DC sputtering for a hardmask: Microstructure and dry etching properties”. Applied Surface Science, 2023, 637, 157895, DOI: 10.1016/j.apsusc.2023.157895.