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Characteristics of Leakage Current in the Dielectric Layer due to Cu Migration during Bias Temperature Stress

Characteristics of Leakage Current in the Dielectric Layer due to Cu Migration during Bias Temperature Stress

저자

S.-S. Hwang, S.-Y. Jung, and Y.-C. Joo

저널 정보

J. Appl. Phys. 104(4), pp. 044511 (2008).

출간연도

2008

S.-S. Hwang, S.-Y. Jung, and Y.-C. Joo, “Characteristics of Leakage Current in the Dielectric Layer due to Cu Migration during Bias Temperature Stress”, J. Appl. Phys. 104(4), pp. 044511 (2008).