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Effect of Film Thickness and Deposition Rate of TiN diffusion Barrier for 3-D Cu Through Silicon Via

Effect of Film Thickness and Deposition Rate of TiN diffusion Barrier for 3-D Cu Through Silicon Via

저자

Young-Joo Lee, Han-Wool Yeon, Sung-Yup Jeong, Se-Kwon Na, Jong-Seung Park, Yong-Yoon Choi, Oh-Sung Song, and Young-Chang Joo

저널 정보

Electronic Materials Letters 10(1), 2013

출간연도

2013

Young-Joo Lee, Han-Wool Yeon, Sung-Yup Jeong, Se-Kwon Na, Jong-Seung Park, Yong-Yoon Choi, Oh-Sung Song, and Young-Chang Joo, “Effect of Film Thickness and Deposition Rate of TiN diffusion Barrier for 3-D Cu Through Silicon Via”, Electronic Materials Letters 10(1), 2013 DOI: 10.1007/s13391-013-3108-0.