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Electrical reliability and interfacial adhesion of Cu(Mg) thin films for interconnect process adaptability

Electrical reliability and interfacial adhesion of Cu(Mg) thin films for interconnect process adaptability

저자

S.-M. Yi, J.-U. An, S.-S. Hwang, J.-R. Yim, Y.-H. Huh, Y.-B. Park and Y.-C. Joo

저널 정보

Thin Solid Films 516(8), pp. 2325 (2008)

출간연도

2008

S.-M. Yi, J.-U. An, S.-S. Hwang, J.-R. Yim, Y.-H. Huh, Y.-B. Park and Y.-C. Joo, “Electrical reliability and interfacial adhesion of Cu(Mg) thin films for interconnect process adaptability”, Thin Solid Films 516(8), pp. 2325 (2008)