Juree Hong, Sanggeun Lee, Heetak Han, Chandreswar Mahata, Han-Wool Yeon, Bon-Woong Koo, Seong-Il Kim, Taewook Nam, Byung-Wook Min, Young-Chang Joo, Young-Woon Kim, Hyungjun Kim, and Taeyoon Lee, “Graphene as an atomically thin barrier to Cu diffusion into Si”, Nanoscale 6(13) 2014 DOI: 10.1039/C3NR06771H.