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In situ study of stress relaxation mechanisms of pure Al thin films during isothermal annealing

Home In situ study of stress relaxation mechanisms of pure Al thin films during isothermal annealing

In situ study of stress relaxation mechanisms of pure Al thin films during isothermal annealing

저자

S.-J. Hwang, Y.-C. Joo, Y.-D. Lee, Y.-B. Park, J.-H. Lee, and C.-O. Jeong

저널 정보

Scripta Mater. 54, pp.1841 (2006).

출간연도

2006

링크

https://doi.org/10.1016/j.scriptamat.2006.02.024

S.-J. Hwang, Y.-C. Joo, Y.-D. Lee, Y.-B. Park, J.-H. Lee, and C.-O. Jeong, “In situ study of stress relaxation mechanisms of pure Al thin films during isothermal annealing”, Scripta Mater. 54, pp.1841 (2006).