Home Stress Relaxation during Isothermal Annealing in Electroplated Cu Films
저자
S.-J. Hwang, Y.-C. Joo, J. Koike
저널 정보
Thin Solid Films 516(21), pp. 7588-7594 (2008).
출간연도
2008
링크
https://doi.org/10.1016/j.tsf.2008.03.030
S.-J. Hwang, Y.-C. Joo, J. Koike, “Stress Relaxation during Isothermal Annealing in Electroplated Cu Films”, Thin Solid Films 516(21), pp. 7588-7594 (2008).