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Stress Relaxation during Isothermal Annealing in Electroplated Cu Films

Stress Relaxation during Isothermal Annealing in Electroplated Cu Films

저자

S.-J. Hwang, Y.-C. Joo, J. Koike

저널 정보

Thin Solid Films 516(21), pp. 7588-7594 (2008).

출간연도

2008

S.-J. Hwang, Y.-C. Joo, J. Koike, “Stress Relaxation during Isothermal Annealing in Electroplated Cu Films”, Thin Solid Films 516(21), pp. 7588-7594 (2008).