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The electric field dependence of Cu migration induced dielectric failure in interlayer dielectric for integrated circuits

The electric field dependence of Cu migration induced dielectric failure in interlayer dielectric for integrated circuits

저자

S.-S. Hwang, S.-Y. Jung, and Y.-C. Joo

저널 정보

J. Appl. Phys. 101, pp. 074501 (2007).

출간연도

2007

S.-S. Hwang, S.-Y. Jung, and Y.-C. Joo, “The electric field dependence of Cu migration induced dielectric failure in interlayer dielectric for integrated circuits”, J. Appl. Phys. 101, pp. 074501 (2007).