Home The electric field dependence of Cu migration induced dielectric failure in interlayer dielectric for integrated circuits
저자
S.-S. Hwang, S.-Y. Jung, and Y.-C. Joo
저널 정보
J. Appl. Phys. 101, pp. 074501 (2007).
출간연도
2007
링크
https://doi.org/10.1063/1.2714668
S.-S. Hwang, S.-Y. Jung, and Y.-C. Joo, “The electric field dependence of Cu migration induced dielectric failure in interlayer dielectric for integrated circuits”, J. Appl. Phys. 101, pp. 074501 (2007).