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The self-formatting barrier characteristics of Cu-Mg/SiO2 and Cu-Ru/SiO2 films for Cu interconnects

Home The self-formatting barrier characteristics of Cu-Mg/SiO2 and Cu-Ru/SiO2 films for Cu interconnects

The self-formatting barrier characteristics of Cu-Mg/SiO2 and Cu-Ru/SiO2 films for Cu interconnects

저자

S.-M. Yi, K.-Ho Jang, J.-U. An, S.-S. Hwang, and Y.-C. Joo

저널 정보

Microelectron. Reliab. 48(5), pp. 744 (2008)

출간연도

2008

링크

https://doi.org/10.1016/j.microrel.2007.12.005

S.-M. Yi, K.-Ho Jang, J.-U. An, S.-S. Hwang, and Y.-C. Joo, “The self-formatting barrier characteristics of Cu-Mg/SiO2 and Cu-Ru/SiO2 films for Cu interconnects”, Microelectron. Reliab. 48(5), pp. 744 (2008)