Home Cu Contamination of the nMOSFET in a 3-D Integrated Circuit under Thermal and Electrical Stress
저자
H.-W. Yeon, S.-Y. Jung, J.-R. Lim, J.-W. Pyun, H.-W. Kim, D.-H. Baek and Y.-C. Joo
저널 정보
Electrochem. Solid. St., 15(5), pp. H157-H160 (2012)
출간연도
2012
링크
https://iopscience.iop.org/article/10.1149/2.018205esl
H.-W. Yeon, S.-Y. Jung, J.-R. Lim, J.-W. Pyun, H.-W. Kim, D.-H. Baek and Y.-C. Joo, “Cu Contamination of the nMOSFET in a 3-D Integrated Circuit under Thermal and Electrical Stress”, Electrochem. Solid. St., 15(5), pp. H157-H160 (2012)